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https://hdl.handle.net/11147/2482
Title: | Local oxidation nanolithography on Hf thin films using atomic force microscopy (AFM) | Authors: | Büyükköse, Serkan Okur, Salih Özyüzer, Gülnur Aygün |
Keywords: | Hafnium Applied voltages Thin films Dc magnetron sputtering Relative humidities |
Publisher: | IOP Publishing Ltd. | Source: | Büyükköse, S., Okur, S., and Aygün, G. (2009). Local oxidation nanolithography on Hf thin films using atomic force microscopy (AFM). Journal of Physics D: Applied Physics, 42(10). doi:10.1088/0022-3727/42/10/105302 | Abstract: | Well controlled Hf oxide patterns have been grown on a flat Hf thin film surface produced by the dc magnetron sputtering method on Si and SiOx substrates. These patterns have been created by using the technique of semi-contact scanning probe lithography (SC-SPL). The thickness and width of the oxide patterns have been measured as a function of applied voltage, duration and relative humidity. There is a threshold voltage even at 87% humidity, due to insufficient energy required to start the oxide growth process for a measurable oxide protrusion. Electrical characterization was also performed via the I-V curves of Hf and HfOx structures, and the resistivity of HfO x was found to be 4.284 × 109 Ω cm. In addition to the I-V curves, electric force microscopy and spreading surface resistance images of Hf and HfOx were obtained. | URI: | http://dx.doi.org/10.1088/0022-3727/42/10/105302 http://hdl.handle.net/11147/2482 |
ISSN: | 0022-3727 0022-3727 1361-6463 |
Appears in Collections: | Physics / Fizik Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection |
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