Please use this identifier to cite or link to this item: https://hdl.handle.net/11147/2730
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dc.contributor.authorPichon, L.-
dc.contributor.authorOkur, Salih-
dc.contributor.authorÖztürk, Orhan-
dc.contributor.authorRivière, J. P.-
dc.contributor.authorDrouet, M.-
dc.date.accessioned2017-01-06T07:25:43Z-
dc.date.available2017-01-06T07:25:43Z-
dc.date.issued2010-06-
dc.identifier.citationPichon, L., Okur, S., Öztürk, O., Rivière, J. P., and Drouet, M. (2010). CoCrMo alloy treated by floating potential plasma assisted nitriding and plasma based ion implantation: Influence of the hydrogen content and of the ion energy on the nitrogen incorporation. Surface and Coatings Technology, 204(18-19), 2913-2918. doi:10.1016/j.surfcoat.2010.01.050en_US
dc.identifier.issn0257-8972-
dc.identifier.urihttp://doi.org/10.1016/j.surfcoat.2010.01.050-
dc.identifier.urihttp://hdl.handle.net/11147/2730-
dc.description.abstractNitriding was performed on a medical grade CoCrMo alloy at 400°C in N2 or N2-H2 atmosphere at a working pressure of 0.84Pa for 2h. Various surface treatment techniques were used to incorporate nitrogen into the CoCrMo alloy: without any plasma assistance, by floating potential radio-frequency plasma assisted nitriding (FPPAN), by plasma based ion implantation (PBII) with several high voltage accelerations (up to 20kV). Without plasma activation, no nitrogen is incorporated in the CoCrMo. On the contrary, all the plasma or PBII treated samples show the formation of a nitrogen-rich f.c.c. γN phase. The layer nitrided over few microns has a nitrogen composition ranging from 30at.% to about 20at.% near the nitrided layer-substrate interface, with an enhanced surface microhardness. Hydrogen is found to enhance the nitriding efficiency. Without hydrogen, a high voltage polarization provides a supplementary amount of implanted nitrogen available for further diffusion and the sputtering of the surface passive oxide. So, with limited high voltages, thicker layers with higher amounts of nitrogen can be achieved by PBII compared to plasma nitriding. However, with higher voltages, the sputtering becomes too important and the nitride layer is thinner. © 2010 Elsevier B.V.en_US
dc.language.isoenen_US
dc.publisherElsevier Ltd.en_US
dc.relation.ispartofSurface and Coatings Technologyen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectNitrogen plasmaen_US
dc.subjectExpanded austenite structureen_US
dc.subjectPlasma based ion implantationen_US
dc.subjectWear resistanceen_US
dc.subjectMolybdenum alloysen_US
dc.subjectCobalt alloysen_US
dc.titleCoCrMo alloy treated by floating potential plasma assisted nitriding and plasma based ion implantation: Influence of the hydrogen content and of the ion energy on the nitrogen incorporationen_US
dc.typeArticleen_US
dc.authoridTR4824en_US
dc.institutionauthorOkur, Salih-
dc.institutionauthorÖztürk, Orhan-
dc.departmentİzmir Institute of Technology. Physicsen_US
dc.identifier.volume204en_US
dc.identifier.issue18-19en_US
dc.identifier.startpage2913en_US
dc.identifier.endpage2918en_US
dc.identifier.wosWOS:000279378600010en_US
dc.identifier.scopus2-s2.0-77953359920en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.identifier.doi10.1016/j.surfcoat.2010.01.050-
dc.relation.doi10.1016/j.surfcoat.2010.01.050en_US
dc.coverage.doi10.1016/j.surfcoat.2010.01.050en_US
dc.identifier.wosqualityQ1-
dc.identifier.scopusqualityQ1-
item.languageiso639-1en-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.grantfulltextopen-
item.fulltextWith Fulltext-
item.openairetypeArticle-
crisitem.author.dept04.05. Department of Pyhsics-
crisitem.author.dept04.05. Department of Pyhsics-
Appears in Collections:Physics / Fizik
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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