Please use this identifier to cite or link to this item: https://hdl.handle.net/11147/4056
Full metadata record
DC FieldValueLanguage
dc.contributor.advisorOkur, Salihen
dc.contributor.authorBüyükköse, Serkan-
dc.date.accessioned2014-07-22T13:53:05Z-
dc.date.available2014-07-22T13:53:05Z-
dc.date.issued2009en
dc.identifier.urihttp://hdl.handle.net/11147/4056-
dc.descriptionThesis (Master)--Izmir Institute of Technology, Physics, Izmir, 2009en
dc.descriptionIncludes bibliographical references (leaves: 89-96)en
dc.descriptionText in English; Abstract: Turkish and Englishen
dc.descriptionxiii, 96 leavesen
dc.description.abstractThis thesis focuses on local oxidation of metallic thin films using atomic force microscopy (AFM). The primary aim of this thesis is to investigate the growth kinetics of oxide forms of these metallic materials and characterize the resulted oxide structures. In this study, tantalum, hafnium and zirconium thin films were used to be oxidized via AFM. During this work, metallic thin films were grown on Si and SiOx substrates with DC magnetron sputtering method. Thin films were characterized via x-ray diffraction, scanning electron microscopy and atomic force microscopy. Oxidation experiments were performed under different environmental conditions to explore the effect of influential parameters; such as bias voltage, oxidation time and relative humidity, and line shape oxide structures were created on metallic films. Dimensional analysis of created oxide structures was carried out measuring height and line-width of oxide lines as a function of applied voltage, oxidation time and relative humidity. In addition to the dimensional analysis, electrical characterization of metal-oxides was performed via AFM electrical characterization methods which are two terminal I-V measurements, electric force microscopy and spreading resistance measurements. At the end of the thesis, the capability of this method to create lateral metal-oxide-metal junction was shown oxidizing a tantalum stripe and performing in-situ resistance measurement. Patterning of tantalum stripes was accomplished by standard photolithography process and lift-off technique.en
dc.language.isoenen_US
dc.publisherIzmir Institute of Technologyen
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subject.lccQC173.4.S94 .B99 2009en
dc.subject.lcshSurfaces (Physics)en
dc.subject.lcshThin filmsen
dc.subject.lcshOxidationen
dc.subject.lcshAtomic force microscopyen
dc.subject.lcshScanning probe microscopyen
dc.titleElectrical surface modification and characterization of metallic thin films using scanning probe microscope (SPM) nanolithography methoden_US
dc.typeMaster Thesisen_US
dc.institutionauthorBüyükköse, Serkan-
dc.departmentThesis (Master)--İzmir Institute of Technology, Physicsen_US
dc.relation.publicationcategoryTezen_US
item.grantfulltextopen-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.openairetypeMaster Thesis-
item.languageiso639-1en-
item.fulltextWith Fulltext-
Appears in Collections:Master Degree / Yüksek Lisans Tezleri
Files in This Item:
File Description SizeFormat 
T000219.pdfMasterThesis4.41 MBAdobe PDFThumbnail
View/Open
Show simple item record



CORE Recommender

Page view(s)

60
checked on Apr 22, 2024

Download(s)

34
checked on Apr 22, 2024

Google ScholarTM

Check





Items in GCRIS Repository are protected by copyright, with all rights reserved, unless otherwise indicated.