Please use this identifier to cite or link to this item: https://hdl.handle.net/11147/5272
Title: Simulation of 3D inclined/rotated UV lithography and its application to microneedles
Authors: Liu, Shijie
Roeder, George
Aygün, Gülnur
Motzek, Kristian
Evanschitzky, Peter
Erdmann, Andreas
Keywords: 3D simulation
Inclined and rotated exposure
Microneedles
UV lithography
Three dimensional computer graphics
Issue Date: May-2012
Publisher: Urban und Fischer Verlag GmbH und Co. KG
Source: Liu, S., Roeder, G., Aygün, G., Motzek, K., Evanschitzky, P. and Erdmann, A. (2012). Simulation of 3D inclined/rotated UV lithography and its application to microneedles. Optik, 123(10), 928-931. doi:10.1016/j.ijleo.2011.07.007
Abstract: A 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for chemically amplified resists and the Mack development model. As one of the interesting applications employing this promising lithography technique for MEMS fabrication, a solid microneedle for drug delivery is simulated.
URI: http://dx.doi.org/10.1016/j.ijleo.2011.07.007
http://hdl.handle.net/11147/5272
ISSN: 0030-4026
0030-4026
1618-1336
Appears in Collections:Physics / Fizik
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection

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