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Title: Scanning probe oxidation lithography on Ta thin films
Authors: Okur, Salih
Büyükköse, Serkan
Tarı, Süleyman
Keywords: Tantalum thin film
Electrical resistivity
Insulating thin films
Scanning probe lithography
Tantalum oxide
Issue Date: Nov-2008
Publisher: American Scientific Publishers
Source: Okur, S., Büyükköse, S., and Tarı, S. (2008). Scanning probe oxidation lithography on Ta thin films. Journal of Nanoscience and Nanotechnology, 8(11), 5640-5645. doi:10.1166/jnn.2008.324
Abstract: A Semi-Contact Scanning Probe Lithography Technique (SC-SPL) has been applied to create nano-oxide patterns on Ta thin films grown by DC magnetron sputtering method on SiO 2/Si substrates. The height and linewidth profiles of nano-oxide lines created by a conductive AFM tip on Ta film surfaces were measured as a function of applied voltage, oxidation time, humidity, and tip apex curvature. The AFM surface measurements show that the height of the oxides increases linearly with increasing voltage; but there was no oxide growth, when less than 4 V was applied even at 85% relative humidity. Electrical measurements were performed and the resistivities of the TaO x layer and Ta film were obtained as 5.76 × 10 8 and 1.4 × 10 5 Ohm-cm, respectively.
ISSN: 1533-4880
Appears in Collections:Physics / Fizik
PubMed İndeksli Yayınlar Koleksiyonu / PubMed Indexed Publications Collection
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection

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