Please use this identifier to cite or link to this item: https://hdl.handle.net/11147/9934
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dc.contributor.authorYüce, Hürriyet-
dc.contributor.authorAygün, Gülnur-
dc.contributor.authorÖzyüzer, Lütfi-
dc.contributor.authorKöklü, Mehtap-
dc.date.accessioned2021-01-24T18:31:43Z-
dc.date.available2021-01-24T18:31:43Z-
dc.date.issued2015-
dc.identifier.isbn978-1-4799-6974-6-
dc.identifier.urihttps://hdl.handle.net/11147/9934-
dc.descriptionIEEE International Conference on Plasma Sciences (ICOPS)en_US
dc.description.abstract[No abstract available]en_US
dc.description.sponsorshipIEEE NPSS, IEEE, PLAZAMATEKen_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.relation.ispartof2015 42nd IEEE International Conference On Plasma Sciences (ICOPS)en_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.titleCharacterization of VO2 films grown by magnetron sputteringen_US
dc.typeConference Objecten_US
dc.institutionauthorYüce, Hürriyet-
dc.institutionauthorAygün, Gülnur-
dc.institutionauthorÖzyüzer, Lütfi-
dc.departmentİzmir Institute of Technology. Physicsen_US
dc.identifier.wosWOS:000380482200218en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.fulltextNo Fulltext-
item.languageiso639-1en-
item.grantfulltextnone-
item.openairetypeConference Object-
crisitem.author.dept03.09. Department of Materials Science and Engineering-
crisitem.author.dept04.05. Department of Pyhsics-
crisitem.author.dept04.05. Department of Pyhsics-
Appears in Collections:WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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